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Sibirskie Èlektronnye Matematicheskie Izvestiya [Siberian Electronic Mathematical Reports], 2024, Volume 21, Issue 2, Pages 555–569
DOI: https://doi.org/doi.org/10.33048/semi.2024.21.040
(Mi semr1703)
 

Computational mathematics

Impact of the dislocation density on the transient photoluminescence intensity in GaN semiconductor

K. K. Sabelfeldab, A. E. Kireevaba

a Institute of Computational Mathematics and Mathematical Geophysics, pr. Lavrentieva, 6, 630090, Novosibirsk, Russia
b Sobolev Institute of Mathematics, pr. Koptyuga, 4, 630090, Novosibirsk, Russia
Abstract: The time-resolved photoluminescence in a layer of GaN with an embedded array of threading dislocations is studied. An instantaneous spatially uniform source of excitons is considered. The transport and recombination of excitons is governed by a 3D transient drift-diffusion-recombination equation with mixed Dirichlet and Robin boundary conditions on the plane surface and the cylindrical boundaries of the dislocations. We develop a stochastic simulation algorithm which solves this problem by tracking exciton trajectories. The drift of the excitions is affected by the piezoelectric fields around the dislocations. The parameters of the piezoelectric field, the exciton's diffusion length and its mean life time are taken from the experimental study published recently in our triple article in Physical Review Applied of 2022. The main finding in the present paper concerns the relation between the photoluminescence intensity and the dislocation density. It is shown that from a transient photoluminescence curve it is possible to extract the dislocation density with high resolution.
Keywords: photoluminescence, threading dislocations, piezoelectric field, radiative recombination, exciton's lifetime, random walk on spheres, transient drift-diffusion-recombination equation.
Funding agency Grant number
Russian Science Foundation 24-11-00107
Ministry of Science and Higher Education of the Russian Federation 075 15 2022 281
The work is supported by the Russian Science Foundation under Grant N 24-11-00107 in the part of the stochastic algorithms development, and by the Mathematical Center in Akademgorodok under the agreement No 075 15 2022 281 with the Ministry of Science and Higher Education of the Russian Federation in the part of computer simulations.
Received May 10, 2024, published August 23, 2024
Document Type: Article
UDC: 519.6, 519.245
MSC: 65C05, 82B80, 82D37
Language: English
Citation: K. K. Sabelfeld, A. E. Kireeva, “Impact of the dislocation density on the transient photoluminescence intensity in GaN semiconductor”, Sib. Èlektron. Mat. Izv., 21:2 (2024), 555–569
Citation in format AMSBIB
\Bibitem{SabKir24}
\by K.~K.~Sabelfeld, A.~E.~Kireeva
\paper Impact of the dislocation density on the transient photoluminescence intensity in GaN semiconductor
\jour Sib. \`Elektron. Mat. Izv.
\yr 2024
\vol 21
\issue 2
\pages 555--569
\mathnet{http://mi.mathnet.ru/semr1703}
\crossref{https://doi.org/doi.org/10.33048/semi.2024.21.040}
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